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MTTC CLEANROOM

Equipment Signup
General Info
Safety and Emergency
Equipment List
Process List
Users Rate Structure
Users Guide and Signup
Users List
Classes
References
Support
Links


 
EQUIPMENT SIGNUP
Signup for scheduling use of the cleanroom equipment by clicking HERE.

GENERAL INFORMATION
The UNM MTTC Cleanroom opened with Phase I operations during Fall 2001. Since then, the cleanroom has supported several UNM courses, including ECE-474/574 Microelectronics Processing, ECE-495 MEMS, ChNE-586 Statistical Design of Experiments for Semiconductor Manufacturing, and NSMS-519 NEMS/MEMS. In addition, the Cleanroom has supported several courses at regional community colleges, including Semiconductor Manufacturing Technologies (SMT) and Microelectromechanial Systems (MEMS) courses offered by the Central New Mexico Community College. The MTTC Cleanroom is also a training venue for Manufacturing Technologies (MT) labs offered by the Southwest Indian Polytechnical Institute (SIPI). And, the cleanroom supports MEMS workshops for the NSF-sponsored Southwest Center for Microsystems Education (SCME, see link below). The cleanroom also supports basic university research, and prototype development by small companies. The photolithography bay is Class-100. The MTTC Cleanroom is a university Service Center, thus there is a fee for use (see Rate Structure, below). Phase II construction, completed 2007, added a bay/chase space, and NSF MRI-provided DRIE and Parylene coater tools. Phase III construction, completed for 2008, added another bay/chase space, and a six-stack atmospheric and LPCVD furnace. Phase IV construction, for 2009-12, added a RF-sputtering machine and an upgrade to the air-handling systems.

The MTTC Cleanroom has chilled water, process chilled water (PCW), air handling units, DI/RO water, nitrogen, two scrubbers, acid waste neutralization and a backup generator, as equipment support infrastructure. The cleanroom also provides utility support to tenants in adjacent high-bays who seek to demonstrate prototype manufacturing.


SAFETY AND EMERGENCY
The MTTC Cleanroom offers three different levels of safety training prior to entry, depending on the level of use. For simple "aisle" tours, a review of emergency protocols is provided, but no exam is required. For "gown-up" tours, where users (students or other visitors) go into the cleanroom bays to observe tools up close, but do not perform any processing, a half-hour safety presentation is provided, but no exam is required. Users who will be doing any level of wafer processing, whether students, researchers or company users, will be expected to participate in a 90 minute safety tutorial followed by a written exam (a score of at least 80% is needed to gain access to the cleanroom).

In addition to the above safety training requirements, the MTTC Cleanroom staff will provide specific operational and safety training on specific high-tech tools (e.g., sputtering, furnaces, DRIE, plating benches). Users that are qualified on a specific tool are not to provide training to potential tool users. Users that have passed the appropriate general safety training are not to allow others into the cleanroom who have not passed the appropriate general safety training.

PROCESS LIST
The UNM MTTC Cleanroom supports several microfabrication and MEMS processes, including photolithography steps (resist spinning, softbake (hotplate/Blue M oven), contact exposure, bath developing, spin rinse drying, hardbake), wet etch (dedicated KOH, SC1, SC2 and HF baths), solvent /acid cleaning, RIE plasma etch (single wafer), Deep Reactive Ion Etching (DRIE, Alcatel model AMS-100-SDE), parylene coating, diffusion processing (oxidation wet and dry, N-Dope and drive, P-Dope and drive, LPCVD silicon nitride deposition, LPCVD polysilicon deposition, LPCVD oxide deposition), vacuum evaporator, five-source reactive-gas sputter system, E-Beam cure, forming gas diffusion, CO2 critical dryer, metrology (film thickness measurement, four point probe, interferometer, microscopes) and SEM.

Users of the cleanroom are expected to have their process steps checked by cleanroom staff to make sure the chemicals and gasses are compatible with those supported by the cleanroom, and that procedures are within the safety guidelines of the cleanroom.

USERS RATE STRUCTURE
For FY-15 (effective 1 Sep 2014), UNM-based researchers (internal academic), non-UNM-based researchers (external academic), federal laboratory (non-academic) and commercial customers (non-academic), are charged for use of the MTTC Cleanroom on a monthly billing cycle per the following schedule:

  • There is no hourly fee for use of the cleanroom for teaching lab sessions directly related to state-wide university, community college and high school courses. There may be a charge for materials, depending on the number of students and the complexity of the process.
  • Out-of-state trainees will be charged a lab fee of $125 per course or workshop.
  • Base Lab fee (internal academic rate, or the UNM base rate): $50.00/hour from 0-30 hours, $0.00/hour from 30-130 hours, and $50.00/hour beyond 130 hours/month. The Base Lab fee, primarily, covers photolithography and metrology tools. There are additional hourly fees for the CO2 Critical Drier, dicer, DRIE, Electro-plater, Furnace, March Plasma, Parylene Coater, Plating, SEM, AJA Sputter tool, Veeco Interferometer and Veeco Vacuum Evaporator (see table below).
  • The Staff Support fee, applied when staff provide direct tool operation and/or process help, is $53.00/hr for UNM (Internal Academic) rate, and $92.75/hr for the Non-academic (USA) rate.
  • UNM (Internal Academic) rates will be 1.00 x Base [Lab + Staff Support + separate tool] fees.
  • External Academic (USA) rates will be 1.00 x Base [Lab + Staff Support + separate tool] fees.
  • External Academic (non-USA) rates will be 1.50 x Base [Lab + Staff Support + separate tool] fees.
  • Non-Academic (USA) rates will be 1.75 x Base [Lab + Staff Support + separate tool] fees.
  • Non-Academic (non-USA) rates will be 2.00 x Base [Lab + Staff Support + separate tool] fees.
  • Typically, on university federal contracts, there will be an overhead rate charged to the cleanroom fees, however, this charge does not accrue to the MTTC Cleanroom.
  • Equipment fee: Selected utility- and maintenance-intensive equipment will have an additional hourly charge associated with it, above the Base Lab fee. Specifically,
    Equipment-specific fee structure
    Item Academic Rate (USA) Non-Academic Rate (USA) Notes
    CO2 Critical Dryer $42.50/run $74.38/run Requires user certification; no cap
    Dicer $14/hour $24.50/hour Requires user certification; no cap; users will need to bring their own blades or be charged at $45/blade
    DRIE $75/hour $131.25/hour Requires user certification; no cap
    Electro-plater (3-bath with plating cells) $21/hour $36.75/hour Requires user certification; no cap; chemicals and fixtures not provided
    Furnace (Steed 6-stack)
    * Atmospheric, without specialty gasses
    * Atmospheric, with specialty gasses
    * LPCVD

    $21/hour

    $28/hour

    $35.50/hour

    $36.75/hour

    $49/hour

    $62.13/hour
    Requires user certification; no cap
    March Plasma Etcher $7/hour $12.25/hour Requires user certification; no cap
    Parylene Coater $28.50/hour $49.88/hour Requires user certification; no cap
    SEM $28/hour $49/hour Requires user certification; no cap
    Sputtering Tool (AJA five-source) $21/hour $36.75/hour Requires user certification; no cap
    Veeco Interferrometer $21/hour $36.75/hour Requires user certification; no cap
    Veeco Vacuum Evaporator $7/hour $12.25/hour Requires user certification; no cap
  • Each company or research organization is limited to six (6) users (key holders), at any given time.
  • UNM "Junior Faculty" members (pre-tenure) will be charged at the rate of 75% of the UNM (Internal Academic) rate, for their first three years at UNM.
  • Users will pay for chemicals, supplies and targets (for evaporation and sputtering) that are not on the standard MTTC supply list, or exceed the typical consumption rate for normal MTTC cleanroom use. For the AJA sputtering system, MTTC will provide Al, Cu, Cr and Ni targets, which are nominally 3 inch diameter, 1/4 inch thick disks. Other source materials will need to be provided by the user.
  • Commercial users of the cleanroom are expected to sign a Facilities Use Agreement (FUA) prior to use of the facility. A PDF of this Agreement is available for consideration.
  • Users who need MTTC to purchase chemicals and supplies will be charged a 15% service fee on top of the material cost.
  • The cleanroom Base Lab fee, per above schedule, applies in parallel with the tool rate (hours uncapped), even if you are not present in the cleanroom during tool operations. Running multiple tools (hours uncapped) simultaneously will not multiply the application of the Base Lab fee.
  • Users who break tools, such as running power supplies at maximum capacity for extended periods or forcing wafers into load chambers or running tools to their stops, will be charged for the service call required to bring the tool back to proper specifications.

  • USERS GUIDE AND SIGN UP
    A Users Guide for the MTTC Cleanroom is available from the MTTC Cleanroom staff.

    Sign-up sheets for the scheduling of tool use are posted in the MTTC Cleanroom facilities. Users can schedule up to two months in advance on the rolling calendar.

Hours of operation are Monday through Friday, 8 am to 5 pm.
CLick HERE to sign up.

Priority of scheduling is:

(1) training for student labs related to regular university and community college classes and workshops,
(2) university research and development, and
(3) commercial sector use (40% of total tool-hours capacity, minimum). Computerized (internet) signup is at the above "Signup" button.

USERS LIST
The MTTC Cleanroom users have included: UNM undergraduate and graduate students, CNM and SIPI community college students, UNM faculty and student researchers, regional High School faculty members and High School students (via dual-enrollment at CNM), Advent Solar, AgilOptics, BioDirection, Emcore, Defiant Technologies, Gratings Inc., HT Micro Analytical, InterCrossIP, Incitor, K-Tech, LANL, Life Bioscience (3D Glass Solutions), Mechanical Solutions, MEMX, MicroNano Platforms, Optomec, Qynergy, Radiant Technologies, Senda Micro Tech, Skinfrared, Surfect, SNL, Trilumina and VeraLight.

CLASSES
The MTTC cleanroom supports the following UNM courses:
• UNM ECE-574 Microelectronics Processing course (Prof. Hersee)
• UNM ME-561 bioMEMS course (Prof. Lesesman)
• UNM NSMS-519 MEMS Transducer Devices and Technology (Prof. Leseman)
• UNM ChNE-586 Statistics for Design of Experiments in Semiconductor Manufacturing,
as well as MEMS courses at CNMCC. Periodically, the MTTC cleanroom supports week-long (45 hrs) short courses in MEMS, for high school faculty and community college faculty (for information, please contact mep@unm.edu). A MEMS device, such as a pressure sensor, is produced during these short courses.

Full courses, short courses and labs hosted by the MTTC Cleanroom include,

Spring 2006

  • UNM ECE-474/574 Microelectronics Processing course (Prof. Hersee); created FET. (15 students)

Summer 2006

  • The UNM MTTC cleanroom hosted regional High School faculty members (6) for a hands-on MEMS training session, to create a MEMS pressure sensor, from June 5 through June 9, 2006.

Fall 2006

  • CNM MEMS-101 Intro to MEMS course (Instructor: Fabian Lopez), practiced BOE etches on SiO2-coated wafers. (7 NM students)

Spring 2007

  • CNM MEMS-101 Intro to MEMS course (Instructor: Fabian Lopez), practiced BOE etches on SiO2-coated wafers. (12 CNM students)
  • UNM ECE-474/574 Microelectronics Processing course (Prof. Hersee); created FET. (20 students)
  • UNM ECE-595 MEMS, Transducers, Devices and Technology (Prof. Chen); created pressure sensor, and drug delivery probe prototype. (9 students)

Summer 2007

  • The MTTC Cleanroom hosted a week-long MEMS workshop for local high school faculty members, wherein they created a wafer of pressure sensors (4 faculty from Bernalillo High School, June 2007).
  • CNM MEMS-101 Intro to MEMS course (Instructor: Fabian Lopez); created art wafers, practiced cleanroom protocols and safety, learned photolithography, BOE etch, and piranha strip techniques. (9 students)
  • CNM MEMS-220 MEMS Fabrication Techniques course (Instructor: Fabian Lopez); created pressure sensor arrays, practiced cleanroom protocols and safety, learned photolithography, plasma dry-etch, metallization for the "lift-off" process, KOH bulk etch of silicon, electrical testing, and piranha strip techniques. (7 students)

Fall 2007

  • UNM ME-461E/561E, ECE-519 and NSMS-519 ST Theory, Fabrication, and Characterization of Nano/Microelectromechanical Systems (NEMS/MEMS) course (Prof. Leseman); created MEMS pressure sensors and MEMS actuators. (27 students)
  • The MTTC Cleanroom hosted a week-long MEMS workshop for high school faculty members from Santa Fe and Vermont, and university faculty members from Iowa, Texas and Mexico, wherein they created a wafer of pressure sensors (12-16 November 2007)
  • CNM MEMS-101 (Sec. 101) Intro to MEMS course (Instructor: Fabian Lopez), practiced BOE etches on SiO2-coated wafers. (9 CNM students)
  • CNM MEMS-101 (Sec. 102) Intro to MEMS course (Instructor: Fabian Lopez), practiced BOE etches on SiO2-coated wafers. (5 CNM students)
  • CNM MEMS-101 (Sec. 103) Intro to MEMS course (Instructor: Matthias Pleil), practiced cleanroom safety and wafer fabrication. (9 CNM students)
  • CNM MT-2097 (Sec. 102) offered as substitute for MEMS-220; created pressure sensor arrays, practiced cleanroom protocols and safety, learned photolithography, plasma dry-etch, metallization for the "lift-off" process, KOH bulk etch of silicon, electrical testing, and piranha strip techniques. (5 students)

Spring 2008

  • UNM ECE-474/574 Microelectronics Processing course (Prof. Hersee); created FET. (16 students)
  • CNM SMT-2001 sec 101 Semiconductor Fabrication course (Instructor: Fabian Lopez), fabricated functional NMOS transistors, BOE etches of SiO2-coated wafers, Aluminium deposition and etching of wafers, electrical testing. (5 CNM students)
  • Southwest Indian Polytechnic Institute (SIPI), Manufacturing Technology course (Instructors: Nader Vadiee and Manuel Maese); Native American students created "art" wafer during one 4 hour lab session at MTTC cleanroom. (8 students)
  • CNM Introduction to MEMS dual enrollment high school students participated in cleanroom safety and fabrication activities (14 students, Instructors: Olga Vazquez, Albuquerque High School)

Summer 2008

  • The MTTC Cleanroom hosted a week-long SCME/MEMS workshop for 2 UT-Brownsville students, and 4 APS high school faculty members, wherein they created a wafer of pressure sensors (7-11 July 2008)
  • The SCME co-sponsored Introductory MEMS activities at the MTTC for Native American Students participating in the Southwestern Indian Polytechnic Institute ROPE program as well as their ATEC summer program for faculty from tribal colleges. (14 July to 11 August 08; 5 faculty, 3 students; made Art Wafers)
  • CNM Introduction to MEMS (MEMS1001) students participated in cleanroom safety and wafer processing activities. (11 students)
  • CNM MEMS Manufacturing Technology students (MEMS2015/2092) students utilized the MTTC cleanroom learning process characterization and advanced fabrication skills. (4 students)
  • Workshop and meetings held for PED Online Nanoscience Course Development grant contributors, Principal Investigator, Dr. Matthias Pleill

Fall 2008

  • The MTTC was host to a Southwest Center for Microsystems Education (SCME) week-long MEMS fabrication workshop held November 10 through the 14th, 2008. Faculty from Austin Community College (TX), North Dakota State College of Science (ND) and Northwest Vista College (San Antonio, TX) participated with 7 Northwest Vista College students from their two-year Nanotechnology Technician program. The students and faculty, working side-by-side, each fabricated their own wafer and successfully applied surface and bulk micromachining fabrication principles, to make a pressure sensor.
  • The SCME sponsored an Introduction to MEMS workshop for 9 New Mexico middle and high school teachers at the MTTC auditorium. Teachers were also given a tour of the cleanroom facilities. (Instructor: Dr. Matthias Pleil; 15 Nov 2008)
  • CNM Introduction to MEMS (MEMS1001) students participated in Cleanroom Safety and Wafer processing activities. (14 students, Instructor Dr. Matthias Pleil)
  • CNM Introduction to MEMS (MEMS1001) high school dual enrollment students participated in Cleanroom Safety and Wafer processing activities. (14 students, instructor high school teacher Olga Vazquez)
  • UNM ME-461E/561E, ECE-519 and NSMS-519 ST Theory, Fabrication, and Characterization of Nano/Microelectromechanical Systems (NEMS/MEMS) course (Prof. Leseman); created MEMS pressure sensors and MEMS actuators. (27 students)
  • CNM Statistical Controls (MT 2005) students participated in Cleanroom Safety and Wafer processing activities. Students took data from a photoresist coating process developed histograms, determined that the system was stable and developed control charts for this process. (15 students; CNM instructor Fabian Lopez). Approximately 25hrs of cleanroom time)

Spring 2009

  • SCME sponsored Introduction to Microsystems Workshop for teachers utilizing the MTTC Auditorium and clean room facility tour. (8 participants, Instructors: Fabian Lopez and Dr. Matthias Pleil; 01/24/2009)
  • SCME sponsored Microsystems advanced topic workshop (7 NM high school teachers, 5/30/2009)
  • CNM Introduction to MEMS (MEMS1001-21) high school dual enrollment students participated in cleanroom tour, safety and wafer processing activities. (16 students from Socorro High School, Instructor: Dr. Matthias Pleil)
  • CNM Introduction to MEMS (MEMS1001-101) participated in cleanroom tour, safety and wafer processing activities. This course is part online and part in class on Saturdays for hands-on activities (13 students, Instructor: Dr. Matthias Pleil)
  • CNM Introduction to MEMS (MEMS1001-901) high school dual enrollment students will participate in cleanroom safety and wafer processing activities. (9 students, Teacher: Albuquerque High School Teacher Olga Vazquez)
  • CNM MEMS Manufacturing Process (MEMS2001-101) advanced fabrication methods, students fabricate a micro pressure sensor utilizing the MTTC cleanroom for all laboratory work. Approximately 45hrs of cleanroom time. (7 students, Instructor: Fabian Lopez)
  • UNM ECE-474/574 Microelectronics Processing course (Prof. Hersee); created FET. (14 students)
  • The MTTC Cleanroom hosted a one-day MEMS workshop for 12 students from Bernalillo High School (Instructors were: Abe Gurule and Evelyn Eppinger - BHS; Fabian Lopez - CNM (SCME Outreach), Harold Madsen - UNM). The students made an "art wafer" (9 March 2009)

Summer 2009

  • CNM Statistical Controls (MT 2005) students participated in Cleanroom Safety and Wafer processing activities. Students took data from a photoresist coating process developed histograms, determined that the system was stable and developed control charts for this process. (3 students, instructor CNM teacher Fabian Lopez) Approximately 25hrs of cleanroom time.
  • CNM MEMS Manufacturing Lab (MEMS 2092) student participated in Cleanroom Safety and Wafer processing activities. Student learned and review tool set qualifications. Student successfully completed both written and oral exams on clean room tool sets. (1 student, instructor CNM teacher Fabian Lopez) Approximately 45hrs of cleanroom time.
  • CNM SemiConductor Manufacturing Lab (SMT 2092) students participated in Cleanroom Safety and Wafer processing activities. Students fabricated a functioning N-channel enhancement mode MOSFET. (3 students, instructor CNM teacher Fabian Lopez) Approximately 55hrs of cleanroom time.

Fall 2009

  • The Southwest Center for Microsystems Education (SCME) sponsored a MEMS fabrication workshop, held October 13 through the 17th, 2008. Three faculty, one director, and one technician, from Indiana University of Pennsylvania, Bowling Green State University, Penn State University, Danville Community College, and Chippewa Valley Technical College, fabricated a pressure sensor.

Tours hosted by the MTTC Cleanroom include:

  • Albuquerque High School (CNM Instructor Fabian Lopez; AHS Instructor Olga Vasquez; 28 HS students)
  • Santa Fe Indian School (CNM Instructor Fabian Lopez; SFIS Instructor Smokey Trujillo; 35 HS students)
  • CNM ENGR-101 (CNM Instructor Dr. Matt Pleil; 20 CC students)
  • Santa Fe Indian School (SFIS Instructor Smokey Trujillo; 11 HS students, 4/30/08, watched wafer processing)
  • SIPI (12 college students, and Dr. N. Vadiee, 3/27/09)
  • Santa Fe Indian School (SFIS Instructor Smokey Trujillo; 3 HS students; built FET, 16-19 July 2012)

REFERENCEs

  • Small Times (May/June 2007): “Community Colleges are Critical”, by Staff, Vol. 7, No. 3, pg. 28.

SUPPORT

The UNM MTTC Cleanroom Project gratefully acknowledges support from the,

  • State of New Mexico, for capital and operating funds,
  • University of New Mexico, for capital funds,
  • U.S. Department of Commerce, Economic Development Administration (EDA), for capital funds,
  • National Science Foundation, for MRI funds (ECS-0521461),
  • Intel Corporation, for equipment donations and operating funds,
  • Next Generation Economy (NGE) industry cluster, for equipment donations,
  • Philips Semiconductor, for equipment donations,
  • AT&T, for equipment donations.

LINKS

   
 
   
 
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